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A novel proessing technique for reducing contact resistance of n+ Si junctions by a high-κ dielectric prepared by atomic layer deposition
- 제목
- A novel proessing technique for reducing contact resistance of n+ Si junctions by a high-κ dielectric prepared by atomic layer deposition
- 저자
- 조성재
- 발행일
- 2015-02-12
- 학회명
- The 22nd Korean Conference on Semiconductors (KCS 2015)
- 개최지
- 인천 송도컨벤시아
- 개최국가
- 대한민국
- 학회 개최일
- 2015-02-10 ~ 2015-02-12