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Sputtering Characteristic by Changing Magnetic Field in Facing Targets Sputtering System
Sputtering Characteristic by Changing Magnetic Field in Facing Targets Sputtering System
- 제목
- Sputtering Characteristic by Changing Magnetic Field in Facing Targets Sputtering System
- 제목 (타언어)
- Sputtering Characteristic by Changing Magnetic Field in Facing Targets Sputtering System
- 저자
- 박상준
- 발행일
- 2007-06-06
- 학회명
- China NANO 2007
- 개최지
- 중국 베이징
- 개최국가
- 중국
- 학회 개최일
- 2007-06-04 ~ 2007-06-06