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Origin of extra diffraction spots for high crystalline alpha-Ga2O3
- Lee, Yong-Hee;
- Yang, Duyoung;
- Gil, Byeongjun;
- Sheen, Mi-Hyang;
- Yoon, Euijoon;
- ... Yoon, Sangmoon;
- 외 4명
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3초록
This work has investigated the microstructure characteristics of high-quality alpha-Ga2O3 thin film grown on the Al2O3 single crystal substrate membrane. Hetero-epitaxial alpha Ga2O3 crystals reveal the formation of a three-fold symmetry at the initial stage of the growth by the oxygen template provided by the Al2O3. Inversion domains are found, and they have a 180 & DEG; inverted configuration from the surroundings. These IDs lead to extra diffraction spots when observed along [110] and [010].(c) 2023 Author(s). All article content, except where otherwise noted, is licensed under a Creative Commons Attribution (CC BY) license (http://creativecommons.org/licenses/by/4.0/).
키워드
ALPHA-GALLIUM OXIDE; SAPPHIRE SUBSTRATE; GROWTH; GAN; FILMS; NANOMEMBRANE; EPITAXY; CAVITY
- 제목
- Origin of extra diffraction spots for high crystalline alpha-Ga2O3
- 저자
- Lee, Yong-Hee; Yang, Duyoung; Gil, Byeongjun; Sheen, Mi-Hyang; Yoon, Euijoon; Park, Yongjo; Jang, Ho-Won; Yoon, Sangmoon; Kim, Miyoung; Kim, Young-Woon
- 발행일
- 2023-02
- 유형
- Article
- 저널명
- AIP Advances
- 권
- 13
- 호
- 2