Influence of RF Magnetron Sputtering Condition on the ZnO Passivating Layer for Dye-sensitized Solar Cells

Citations

SCOPUS

6

초록

Dye-sensitized solar cells have a FTO/TiO2/Dye/Electrode/Pt counter electrode structure, yet more than a 10% electron loss occurs at each interface. A passivating layer between the TiO2/FTO glass interface can prevent this loss of electrons. In theory, ZnO has excellent electron collecting capabilities and a 3.4 eV band gap, which suppresses electron mobility. FTO glass was coated with ZnO thin films by RF-magnetron sputtering; each film was deposited under different O2:Ar ratios and RF-gun power. The optical transmittance of the ZnO thin film depends on the thickness and morphology of ZnO. The conversion efficiency was measured with the maximum value of 5.22% at an Ar:O2 ratio of 1:1 and RF-gun power of 80 W, due to effective prevention of the electron recombination into electrolytes. © 2013 KIEEME. All rights reserved.

키워드

Dye-sensitized solar cells; Electron recombination; RF-magnetron sputter; ZnO passivating layer; Counter electrodes; Dye-Sensitized solar cell; Electron recombinations; Glass interface; Passivating layer; RF-magnetron sputter; rf-Magnetron sputtering; ZnO thin film; Electron mobility; Electrons; Glass; Magnetron sputtering; Metallic films; Optical films; Passivation; Photoelectrochemical cells; Zinc oxide; Solar cells
제목
Influence of RF Magnetron Sputtering Condition on the ZnO Passivating Layer for Dye-sensitized Solar Cells
저자
Rhee, S.W.; Choi, H.W.
DOI
10.4313/TEEM.2013.14.2.86
발행일
2013-04
유형
Article
저널명
Transactions on Electrical and Electronic Materials
권
14
호
2
페이지
86 ~ 89