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Influence of RF Magnetron Sputtering Condition on the ZnO Passivating Layer for Dye-sensitized Solar Cells
- Rhee, S.W.;
- Choi, H.W.
SCOPUS
6초록
Dye-sensitized solar cells have a FTO/TiO2/Dye/Electrode/Pt counter electrode structure, yet more than a 10% electron loss occurs at each interface. A passivating layer between the TiO2/FTO glass interface can prevent this loss of electrons. In theory, ZnO has excellent electron collecting capabilities and a 3.4 eV band gap, which suppresses electron mobility. FTO glass was coated with ZnO thin films by RF-magnetron sputtering; each film was deposited under different O2:Ar ratios and RF-gun power. The optical transmittance of the ZnO thin film depends on the thickness and morphology of ZnO. The conversion efficiency was measured with the maximum value of 5.22% at an Ar:O2 ratio of 1:1 and RF-gun power of 80 W, due to effective prevention of the electron recombination into electrolytes. © 2013 KIEEME. All rights reserved.
키워드
- 제목
- Influence of RF Magnetron Sputtering Condition on the ZnO Passivating Layer for Dye-sensitized Solar Cells
- 저자
- Rhee, S.W.; Choi, H.W.
- 발행일
- 2013-04
- 유형
- Article
- 권
- 14
- 호
- 2
- 페이지
- 86 ~ 89
- 언어
- ENG
- 출판사
- 한국전기전자재료학회
- 발행국가
- 대한민국
- 분량
- 4 페이지
- ISSN
- E 2092-7592
P 1229-7607