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Post-annealing Effects of Al2O3 Gate Dielectric Fabricated with E-beam Process in Organic Thin-Film Transistors
Post-annealing Effects of Al2O3 Gate Dielectric Fabricated with E-beam Process in Organic Thin-Film Transistors
- 제목
- Post-annealing Effects of Al2O3 Gate Dielectric Fabricated with E-beam Process in Organic Thin-Film Transistors
- 제목 (타언어)
- Post-annealing Effects of Al2O3 Gate Dielectric Fabricated with E-beam Process in Organic Thin-Film Transistors
- 저자
- 권상직
- 발행일
- 2008-12-05
- 학회명
- The 15th International Display Workshops
- 개최지
- 일본 니가타
- 개최국가
- 일본
- 학회 개최일
- 2008-12-03 ~ 2008-12-05