상세 보기
Effects of the Alternating Motion of Substrate on ITO Wet Etch Process in an In-Line Equipment
Effects of the Alternating Motion of Substrate on ITO Wet Etch Process in an In-Line Equipment
- 제목
- Effects of the Alternating Motion of Substrate on ITO Wet Etch Process in an In-Line Equipment
- 제목 (타언어)
- Effects of the Alternating Motion of Substrate on ITO Wet Etch Process in an In-Line Equipment
- 저자
- 조의식
- 발행일
- 2008-08-20
- 학회명
- The 1st International Conference on Microelectronics and plasma Technology
- 개최지
- Ramada Plaza Jeju Hotel, Jeju, Korea
- 개최국가
- 대한민국
- 학회 개최일
- 2008-08-18 ~ 2008-08-20