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Nd:YVO4 Laser Patterning of Various Transparent Conductive Oxide Thin Films on Glass Substrate at a Wavelength of 1,064 nm
- Wang, J.-X.;
- Kwon, S.J.;
- Cho, E.S.
SCOPUS
5초록
At an infra-red (IR) wavelength of 1,064 nm, a diode-pumped Q-switched Nd:YVO4 laser was used for the direct patterning of various transparent conductive oxide (TCO) thin films on glass substrate. With various laser beam conditions, the laser ablation results showed that the indium tin oxide (ITO) film was removed completely. In contrast, zinc oxide (ZnO) film was not etched for any laser beam conditions and indium gallium zinc oxide (IGZO) was only ablated with a low scanning speed. The difference in laser ablation is thought to be due to the crystal structures and the coefficient of thermal expansion (CTE) of ITO, IGZO, and ZnO. The width of the laser-patterned grooves was dependent on the film materials, the repetition rate, and the scanning speed of the laser beam. © 2013 KIEEME. All rights reserved.
키워드
- 제목
- Nd:YVO4 Laser Patterning of Various Transparent Conductive Oxide Thin Films on Glass Substrate at a Wavelength of 1,064 nm
- 저자
- Wang, J.-X.; Kwon, S.J.; Cho, E.S.
- 발행일
- 2013-04
- 유형
- Article
- 권
- 14
- 호
- 2
- 페이지
- 59 ~ 62
- 언어
- ENG
- 출판사
- 한국전기전자재료학회
- 발행국가
- 대한민국
- 분량
- 4 페이지
- ISSN
- E 2092-7592
P 1229-7607