ALD 장비의 Al2O3 공정 안정화를 위한 By-product 성분 분석 및 형성 최소화 방법

초록

The application of the technology for forming Al2O3 thin films using ALD(atomic layer deposition) method is rapidly increasing in the semiconductor and display fields. In order to increase the efficiency of the ALD process in a mass production line, metallic by-products generated from the ALD process chamber must be effectively collected. By collecting by-products flowing out of the chamber with a cold trap device before they go to the vacuum pump, damage to the vacuum pump can be prevented and the work room can be maintained stably, resulting in increased process flow rate. In this study, a cold trap was installed between the ALD process chamber and the dry pump to measure and analyze byproducts generated during the Al2O3 thin film deposition process. As a result, it was confirmed that Al and O elements were emitted, and the capture form was classified into Al(OH)3 and Al2O3 depending on the pipe temperature. In addition, the cause of Al(OH)3 generation could be identified by analyzing the pipe temperature with a thermal imaging camera. This study will contribute to increasing the production process of high-K materials such as Al2O3.

키워드